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Handbook of VLSI Lithography

Handbook of VLSI Lithography - 2nd edition

ISBN13: 978-0080946801

Cover of Handbook of VLSI Lithography 2ND 00 (ISBN 978-0080946801)
ISBN13: 978-0080946801
ISBN10: 0080946801
Cover type: Print On Demand
Edition/Copyright: 2ND 00
Publisher: Vitalsource Technologies, Inc.
Published: 2000
International: No

List price: $310.00

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Handbook of VLSI Lithography - 2ND 00 edition

ISBN13: 978-0080946801

Helbert

ISBN13: 978-0080946801
ISBN10: 0080946801
Cover type: Print On Demand
Edition/Copyright: 2ND 00
Publisher: Vitalsource Technologies, Inc.

Published: 2000
International: No
Summary

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.

Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

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